Characterization of Epitaxial Calcium Fluoride as a Dielectric Material for Ultra-thin Barrier Layers in Silicon Microelectronics
نویسندگان
چکیده
A detailed characterization of injection properties of epitaxial tunnel-thin calcium fluoride layers is performed. Electrical and optical behavior of Au/CaF2/Si capacitors is examined. The results allow for claiming that attained quality of the CaF2 films is adequate for application as a barrier layer in microelectronics.
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